Phys. Rev. A 68, 023803 (2003) [6 pages]

Vacuum ultraviolet argon excimer production by use of an ultrashort-pulse high-intensity laser

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Masanori Kaku *, Takeshi Higashiguchi, Shoichi Kubodera , and Wataru Sasaki
Department of Electrical and Electronic Engineering and Photon Science Center, Miyazaki University, Gakuen Kibanadai Nishi 1-1, Miyazaki 889-2192, Japan

Received 16 March 2003; published 7 August 2003

We report on the observation of Ar2* emission at 126 nm by use of a hollow fiber to guide the high-intensity laser propagation in high-pressure Ar. A small-signal gain coefficient of 0.05 cm-1 was measured at 126 nm by this method. The increase of the Ar2* emission intensity was measured to be exp(2.5), with an increase of the fiber length up to 50 cm. Kinetic analysis revealed that the Ar2* production processes were initiated by the electrons produced by the high-intensity laser through an optical-field-induced ionization (OFI) process. A rapid conductive cooling of the OFI electrons is favorable to initiate the Ar2* formation kinetics more efficiently. This high-density cold plasma production method should be applicable for other vacuum ultraviolet rare-gas excimer lasers.


©2003 The American Physical Society

URL: http://link.aps.org/doi/10.1103/PhysRevA.68.023803
DOI: 10.1103/PhysRevA.68.023803
PACS: 42.55.Lt, 33.20.Ni

* Present address: Institute of Advanced Energy, Kyoto University, Uji, Kyoto 611-0011, Japan. Email address: kaku@iae.kyoto-u.ac.jp
Email address: kubodera@opt.miyazaki-u.ac.jp

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