Low-temperature epitaxial growth of β-SiC by multiple-energy ion implantation

A cubic silicon carbide (β-SiC) buried layer was synthesized in Si(111) using a combination of multienergy carbon ion implantation at room temperature and post-thermal annealing. The crystal structure and the crystalline quality of the β-SiC layer was identified by x-ray diffraction in the θ–2θ mode and was examined by pole figure measurement of x-ray diffraction. Interestingly, by using the multienergy implantation technique, the β-SiC buried layer showed epitaxial growth at annealing temperatures as low as 400 °C. At an annealing temperature of 800 °C, the x-ray pole figures show that the β-SiC buried layer has a near-perfect epitaxial relationship with the silicon substrate.