Phys. Rev. B 61, 7301 - 7304 (2000)Photoelectron diffraction determination of the structure of ultrathin vanadium films on Cu(001)
G. D. Waddill *, D. P. Moore, and O. Ozturk Received 7 September 1999 X-ray photoelectron diffraction (XPD) and low-energy electron diffraction (LEED) have been used to study the structural properties of V thin films on Cu(001). For room-temperature growth, submonolayer coverages result in (1×1) LEED patterns that evolve to exhibit very diffuse (2×1) structure at approximately 1 monolayer coverage. We do not observe any V forward-focusing enhancements for V films that exhibit either the (1×1) or (2×1) structure, suggesting that these structures are limited to the first 1–2 vanadium layers. At coverages above 1 monolayer, the V films display complex LEED patterns characteristic of four bcc(110) domains. This structure persists to V coverages as high as 100 ML, and the LEED and XPD angular scans suggest that V in these films retain the bulk V lattice constant. These results have important ramifications for predictions of magnetic order in vanadium thin films that typically assume pseudomorphic growth. ©2000 The American Physical Society
URL: http://link.aps.org/doi/10.1103/PhysRevB.61.7301 * Author to whom correspondence should be addressed. FAX: 573-341-4715. Electronic address: waddill@umr.edu [ Abstract | Previous article | Next article | Issue 11 ] |
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