Phys. Rev. E 57, 5945 - 5951 (1998)Electrical conductivity of dense copper and aluminum plasmas
A. W. DeSilva and J. D. Katsouros See Also: Erratum Received 10 November 1997 Measurements are reported of the electrical conductivity of dense copper and aluminum plasmas in the temperature range 10–30 kK, in a density range from about one-fifth solid density down to 0.02 g/cm3. Plasmas were created by rapid vaporization of metal wires in a water bath. At temperatures below about 15 kK, as density decreases from the highest values measured, the conductivity falls roughly as the cube of density, reaches a minimum, and subsequently rises to approach the Spitzer prediction at low density. This minimum is not seen for temperatures above about 20 kK. These results are compared with several theoretical predictions. ©1998 The American Physical Society
URL: http://link.aps.org/doi/10.1103/PhysRevE.57.5945 See AlsoErratum: A. W. DeSilva and J. D. Katsouros, Erratum: Electrical conductivity of dense copper and aluminum plasmas [Phys. Rev. E 57, 5945 (1998)], Phys. Rev. E 59, 3774 (1999) [ Abstract | Previous article | Next article | Issue 5 ] |
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