Phys. Rev. Lett. 44, 1150 - 1153 (1980)Transition to Localization in Granular Aluminum Films |
PRL Celebrates 50 Years
This Week's Milestone Letters are from 1984: |
G. Deutscher
Tel-Aviv University, Ramat-Aviv, Israel
B. Bandyopadhyay, T. Chui, P. Lindenfeld, W. L. McLean, and T. Worthington *
Serin Physics Laboratory, Rutgers University, New Brunswick, New Jersey 08903
Received 2 November 1979
The temperature dependence of the electrical resistivity of granular aluminum films changes from one regime to another as their superconducting transition temperatures drop towards absolute zero. In nonsuperconducting specimens we observe the exponential behavior associated with strong localization. In the other regime the specimens show a weaker, logarithmic dependence.
©1980 The American Physical Society
URL: http://link.aps.org/abstract/PRL/v44/p1150
DOI: 10.1103/PhysRevLett.44.1150
PACS: 71.50.+t, 71.30.+h, 71.55.Jv
* Present address: IBM Thomas J. Watson Research Center, Yorktown Heights, N. Y. 10598.
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