Phys. Rev. Lett. 85, 2733 - 2736 (2000)

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

PRL Celebrates 50 Years

This Week's Milestone Letters are from 1973:
Milestone Letters: Asymptotic Freedom

Abstract

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Agedi N. Boto¹, Pieter Kok², Daniel S. Abrams¹, Samuel L. Braunstein², Colin P. Williams¹, and Jonathan P. Dowling¹ ^*
¹Jet Propulsion Laboratory, California Institute of Technology, Mail Stop 126-347, 4800 Oak Grove Drive, Pasadena, California 91109
²Informatics, University of Wales, Bangor LL57 1UT, United Kingdom

Featured in Physics News Update Received 4 January 2000

Classical optical lithography is diffraction limited to writing features of a size λ/2 or greater, where λ is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size λ/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N² more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.

URL: http://link.aps.org/abstract/PRL/v85/p2733
DOI: 10.1103/PhysRevLett.85.2733
PACS: 42.50.Hz, 42.25.Hz, 42.65.-k, 85.40.Hp

^* Electronic address: Jonathan.P.Dowling@jpl.nasa.gov

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Phys. Rev. Lett. 85, 2733 - 2736 (2000)

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

PRL Celebrates 50 Years

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