Phys. Rev. Lett. 86, 1389 - 1389 (2001)

Comment on “Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit”

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Girish S. Agarwal
Physical Research Laboratory Navrangpura Ahmedabad-380 009, India

Robert W. Boyd, Elna M. Nagasako, and Sean J. Bentley
The Institute of Optics University of Rochester Rochester, New York 14627

Received 18 October 2000

A Comment on the Letter by Agedi N. Boto, et al., Phys. Rev. Lett. 85, 2733 (2000).


©2001 The American Physical Society

URL: http://link.aps.org/abstract/PRL/v86/p1389
DOI: 10.1103/PhysRevLett.86.1389
PACS: 42.50.Hz, 42.25.Hz, 42.65.-k, 85.40.Hp

See Also

Original: Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Samuel L. Braunstein, Colin P. Williams, and Jonathan P. Dowling, Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit, Phys. Rev. Lett. 85, 2733 (2000)

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